Pe-25 Venus Low Cost Plasma Cleaning System

PE-25 Venus Low Cost Plasma Cleaner

The fully automated PE-25 Venus has all the features of the standard PE-25 but includes advanced software and control features for greater control over the plasma process. All Venus systems include computerized gas valves for highly accurate and repeatable gas flow rate control.

A laptop loaded with Plasma Etch, Inc. software is included for fully automatic system operation, multiple recipe storage, data logging/trending, events/alarms, and multi-step sequencing.

This system includes the same laptop control found on our larger systems, enabling mass flow controllers, dual sequence programming, as well as process data acquisition and archiving.


To purchase a PE-25 Venus, please contact us at (775) 883-1336 or email us at sales@plasmaetch.com.


Standard Features

Electrode Configuration

One Horizontal (3.5"Wx7"D + 2.5" Clearance)

Generator

400W 50KHz Continuously Variable Power Supply with Automatic Matching Network

Gas Control

One 0-25cc/min Rotometer with Precision Needle Valve

Vacuum Gauge

1-2000 mT

Control System

A laptop loaded with Plasma Etch, Inc. software is included for fully automatic system operation, process sequencing, multiple recipe storage, and other advanced features.

Chamber Material

6061-T6 Aluminum

Chamber Dimensions

8" Deep x 5" Round

Unit Dimensions

14"x14.5"x18"

Unit Weight

52lbs

Made in the U.S.A.

Note: A vacuum pump is necessary for operation and not included in standard features. High frequency units may have larger external dimensions, so check with your sales rep if your space is limited.

Optional Features

All compact benchtop systems can be thoroughly customized with a wide range of features including:

MHz Power Supplies with Automatic Matching Network

Higher watt/frequency power supplies

Dry Vacuum Pump

For more control over the process chamber pressure

Chamber and Vacuum Pump Purge Systems / Air Dryer / Purge Gas Generator

To ensure thorough removal of contaminants from operating equipment, providing uniformity and increasing longevity

Additional Gas Inputs/Rotometers

Allows for more complex process gas combinations

Additional Digital Mass Flow Controllers

Provides digital automation and monitoring of process gases

Light Tower

For easy visualization of the steps of the plasma processing sequence

Facility Requirements

Electrical

120VAC / 60Hz @ 15A or 220VAC / 50Hz @ 14A