
PE-2000R Industrial Reel-to-Reel Plasma Processing System
The PE-2000R roll to roll plasma system is specially fitted with a continuous feed drive and take-up system to accommodate continuous flexible substrates and roll/reel mounted materials. Our reel-to-reel plasma system can accept web widths of 2” to 24” with spindle diameters of 10”.
Tension control is accomplished by a pivoting arm 3 inches in diameter in contact with the web in the process chamber coupled to a counterweight system outside the chamber isolated by a magnetic fluid feedthrough. It is actively controlled by the subsystem transport control.
Virtually any tension can be set by changing the external counter weights outside the chamber. Edge tracking and control is optically detected and is automatically controlled by a closed-loop servo motor mechanism bellows, isolated from the process. The actuator is outside the chamber.
To purchase a PE-2000R, please contact us at (775) 883-1336 or email us at sales@plasmaetch.com.
Standard Features
Electrode ConfigurationVertical, Planar 4 Level, 24” W x 36”L, 72” total process area will allow 1 meter per minute
Generator2500W 13.56MHz Continuously Variable Power Supply with Automatic Matching Network
Gas ControlThree 0-2000cc Mass Flow Controllers with Low Gas Source Alarm and Multiple Gas Selection
Control SystemColor PLC-Based Touch Screen Control Interface
Vacuum Pump
2-Stage Dry Pump (Oxygen Service – Krytox Charged)
Vacuum Gauge1-2000 mT
Chamber Material6061-T6 Aluminum
Unit Dimensions120"x45”x79”
Additional AccessoriesFume Scrubber
Air Dryer for Purge Gas Generation
Automatic Nitrogen Pump Purge System
Controlled Rate Nitrogen Chamber Purge System
Signal Light Tower
Temperature Control System
Made in the U.S.A.Optional Features
Most systems can be customized with a wide range of options including:
Custom Sized Vacuum Chamber, Number/Size of ElectrodesTo ensure your system is able to specifically meet your throughput requirements
Larger MHz Power Supplies with Automatic Matching NetworkHigher watt/frequency power supplies
PC-based Control SystemFor fully automatic system control, multi-step process sequencing, multiple recipe storage, data logging/trending, events/alarms, etc.
Temperature Control SystemTo maintain specific temperatures in the processing chamber for enhanced uniformity and application-specific needs
Dry and Oil-Driven Vacuum Pumps and Blower BoostersA variety of vacuum pump options for more control over the process chamber pressure
Chiller System for Dry Vacuum PumpNecessary for the operation of a dry vacuum pump
Chamber and Vacuum Pump Purge Systems / Air Dryer / Purge Gas GeneratorTo ensure thorough removal of contaminants from operating equipment, providing uniformity and increasing longevity
Vacuum Pump Oil Mist EliminatorCaptures oil from vacuum pump exhaust
Vacuum Pump Oil FiltrationFilters the vacuum pump oil down to a 3 micron level which increases the longevity of the oil and the vacuum pump
Automatic Vacuum ControlProvides automation of the process chamber pressure
Additional Digital Mass Flow ControllersProvides digital automation and monitoring of process gases
Software Configurable Gas Steering MatrixDesigned to allow for up to 5 process gas inputs; 3 are selectable at any time by software driven controls
Low Gas-Source AlarmNotification for when your process gas container needs replenished
Light TowerFor easy visualization of the steps of the plasma processing sequence
Fume ScrubberTo eliminate hazardous fumes/contaminants from the chamber/vacuum pump exhaust
Facility Requirements
Electrical120/208 VAC, 50/60 Hz, 3 Phase, 5 Wire 100 Amps
Compressed Air Service80-100PSI, 0.5CFM
Regulated Process Gases25-30PSI
Closed Loop Chilled Water Source