PE-200 Industrial Benchtop Plasma Processing System
The PE-200 is a complete industrial grade plasma treatment solution capable of plasma cleaning, etching, reactive ion etching (RIE), and more. This model is perfect for manufacturers, universities, research facilities, or any other company in need of a cost-effective, high yield plasma processing solution.
This model is available in one of three possible configurations:
1) Plasma Cleaning/Plasma Etching
2) Reactive Ion Etching (RIE)
3) Convertible Configuration – Includes both isotropic and anisotropic plasma processing in a single system. Removable tray configuration.
To purchase a PE-200, please contact us at (775) 883-1336 or email us at sales@plasmaetch.com.
Standard Features
Electrode ConfigurationThree Stacked Horizontal (13"Wx16"D + 3" Clearance) (Several optional configurations available)
Generator300W 13.56MHz Continuously Variable Power Supply with Automatic Matching Network
Gas ControlOne 0-200cc Mass Flow Controller
Control SystemLaptop Equipped with Plasma Etch, Inc. Control Software for Fully Automatic System Operation
Vacuum Gauge1-2000 mT
Vacuum Pump29CFM 2-Stage Direct Drive Oil Pump (Oxygen Service – Krytox Charged)
3 Micron Oil Filtration System
Chamber Material6061-T6 Aluminum
Chamber Dimensions17”x17”x14”
Unit Dimensions35"x31"x31"
Unit Weight550lbs
Vacuum Pump Weight150lbs
Made in the U.S.A.Optional Features
Most systems can be customized with a wide range of options including:
Custom Sized Vacuum Chamber, Number/Size of ElectrodesTo ensure your system is able to specifically meet your throughput requirements
Reactive Ion ElectrodesEnables reactive ion etching
MHz Power Supplies with Automatic Matching NetworkHigher watt/frequency power supplies
PC-based Control SystemFor fully automatic system control, multi-step process sequencing, multiple recipe storage, data logging/trending, events/alarms, etc.
Electrostatic ShieldingGreatly increases process uniformity by eliminating excess etching at the outer bounds of the processed material
Temperature Control SystemTo maintain specific temperatures in the processing chamber for enhanced uniformity and application-specific needs
Dry Vacuum PumpFor more control over the process chamber pressure
Chamber and Vacuum Pump Purge Systems / Air Dryer / Purge Gas GeneratorTo ensure thorough removal of contaminants from operating equipment, providing uniformity and increasing longevity
Vacuum Pump Oil Mist EliminatorCaptures oil from vacuum pump exhaust
Vacuum Pump Oil FiltrationFilters the vacuum pump oil down to a 3 micron level which increases the longevity of the oil and the vacuum pump
Automatic Vacuum ControlProvides automation of the process chamber pressure
Additional Digital Mass Flow ControllersProvides digital automation and monitoring of process gases
Software Configurable Gas Steering MatrixDesigned to allow for up to 5 process gas inputs; 3 are selectable at any time by software driven controls
Low Gas-Source AlarmNotification for when your process gas container needs replenished
Light TowerFor easy visualization of the steps of the plasma processing sequence
Fume ScrubberTo eliminate hazardous fumes/contaminants from the chamber/vacuum pump exhaust
Facility Requirements
Electrical120V/208VAC (Five wire, three phase) or 208VAC (Four wire, three phase)
Compressed Air Service80-100PSI, 0.5CFM
Regulated Process Gases15PSI, 2-Stage Regulator
